Fully Automatic ICP-PECVD Insulating Dielectric Layer Deposition System [Re-tender] Bid Evaluation Results Announcement

This announcement pertains to the bid evaluation results for a re-tender concerning a Fully Automatic ICP-PECVD (Inductively Coupled Plasma - Plasma Enhanced Chemical Vapor Deposition) Insulating Dielectric Layer Deposition System. The original tender was issued under reference number 0779-26400341A018. The system is designed for advanced manufacturing processes, specifically for depositing insulating dielectric layers, likely within the semiconductor or microelectronics industry. The procurement is categorized under the specialized equipment manufacturing sector and is located in Shaanxi Province, China. Funding for this acquisition is confirmed as spot exchange (现汇), indicating immediate financial availability. The re-tender suggests that the initial bidding process may not have yielded a satisfactory outcome, necessitating a new round of evaluation. This equipment is critical for manufacturers requiring high-precision deposition of thin films for integrated circuits or other electronic components.

This is a supplies contract in the trade and industry sector. Located in China, Asia, this opportunity is open to firms and consortiums.

Published through ChinaBidding, a national government procurement portal. Public procurement tenders follow the country's national bidding regulations and may have specific eligibility and documentation requirements for the supply of goods in the trade and industry sector. Supply contracts typically require bidders to demonstrate product compliance with technical specifications, delivery capacity, and relevant certifications. This contract has already been awarded. The information is published for transparency and market intelligence purposes.