Plasma Etcher for Oxygen and Argon ICP-RIE Plasmas
About This Opportunity
TranslatedThis tender concerns the procurement of a single unit of a plasma etcher specifically designed for oxygen and argon Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) processes. The equipment is intended for advanced material processing applications, likely within a research and development or specialized manufacturing environment. Key technical specifications and performance requirements for the plasma etcher are expected to be detailed in the full tender documentation, but the core functionality revolves around precise etching capabilities using oxygen and argon-based plasma chemistries. The ICP-RIE technology ensures high-density plasma generation, enabling anisotropic etching with excellent control over etch profiles and rates. This type of equipment is crucial for microfabrication, semiconductor processing, and the development of advanced materials and devices where precise pattern transfer and surface modification are required. Interested bidders will need to demonstrate their ability to supply a system that meets stringent quality standards and offers reliable performance for these demanding applications. Further details regarding installation, training, warranty, and after-sales support are anticipated to be part of the procurement package. The tender is open to suppliers capable of providing this specialized scientific instrument.
This is a supplies contract in the architecture and engineering sector, with a focus on Electrical Engineering. Located in Germany, Europe, this opportunity is open to firms and consortiums.
Published through TED - Tenders Electronic Daily (EU), a national government procurement portal. Public procurement tenders follow the country's national bidding regulations and may have specific eligibility and documentation requirements for the supply of goods in the architecture and engineering sector. Supply contracts typically require bidders to demonstrate product compliance with technical specifications, delivery capacity, and relevant certifications. This contract has already been awarded. The information is published for transparency and market intelligence purposes.
Description
Original language: GermanThis tender, originating from Germany and published on the TED platform, seeks the procurement of a single unit of a plasma etching system. Specifically, the requirement is for a Plasmaätzer für Sauerstoff und Argon-ICP-RIE-Plasmen, which translates to an oxygen and argon Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) plasma etcher. This advanced equipment is essential for microfabrication processes, enabling precise material removal and patterning through plasma-based etching techniques.
The contracting authority, managed by the Publications Office of the European Union, is looking to acquire a high-performance system capable of utilizing both oxygen and argon plasma chemistries. ICP-RIE technology is known for its ability to achieve high etch rates with excellent anisotropy and uniformity, making it suitable for demanding applications in research and development or specialized manufacturing environments.
Typical requirements for such a tender would include detailed specifications regarding the system's chamber design, plasma generation capabilities (e.g., RF power, frequency), gas delivery systems, vacuum requirements, control interfaces, and safety features. Bidders are expected to provide comprehensive technical documentation, demonstrate compliance with relevant industry standards, and offer installation, training, and after-sales support. The successful tender will likely involve a thorough evaluation of technical proposals, pricing, and supplier experience in delivering sophisticated plasma processing equipment.
Data provenance
This notice is sourced from TED - Tenders Electronic Daily (EU) and was originally published on March 17, 2025. Last refreshed 25 days ago. Original language: German. BidsFactory mirrors official procurement notices and links back to the source for full legal text.
About Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik
Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik has issued 6 procurement notices on BidsFactory, including 2 currently open and 4 awarded contracts. Activity concentrates in Information & Communication Technology, Architecture & Engineering Services, and Transport & Logistics. All notices are published for Germany. Notices are distributed via DÖE Bekanntmachungsservice (Germany) and TED - Tenders Electronic Daily (EU). Most recent publication: July 8, 2026.
Frequently asked questions about this tender
Who is the contracting authority?
This notice was issued by Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik in Germany. The authority is responsible for evaluating bids, awarding the contract, and managing performance.
What type of contract is this?
This is a Supplies contract in the Architecture & Engineering Services sector. The classification helps bidders match the opportunity to their qualifications and registered scope of supply.
How much was the contract awarded for?
Oxford Instruments GmbH was awarded the contract for €329,684. The figure reflects the value disclosed by the contracting authority in the award notice.
Where will the contract be performed?
The contract is for delivery in Germany. Foreign bidders should review local registration, taxation, and any in-country presence requirements before submitting.
How can I submit a bid?
Visit TED - Tenders Electronic Daily (EU) to access the full notice, required documents, and submission instructions provided by the contracting authority.
Is this tender still open?
No — the contract has already been awarded to Oxford Instruments GmbH. The award notice is archived on BidsFactory for transparency and market intelligence.
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